Applied Materials Israel Ltd.

A voltage modulator for modifying the magnitude of an input signal is provided. The voltage modulator comprises an upstream main input for receiving the input signal, a downstream main output configured to deliver the modified output signal, and an operative block comprising a plurality of gain blocks spanning between the main input and output. Each of the gain blocks comprises a transistor comprising a source, a drain, and a gate, the transistor being configured to vary conductivity between the source and the drain based on a voltage applied to the gate; a block output; and a biasing block connected to the drain of the transistor via the block output and to the gate of the transistor, and configured to facilitate maintaining the transistor in its saturation region. The transistor source of each gain block is connected to the block output of an adjacent upstream gain block.

A system and method for thermal management of an optical system. The system comprises at least one laser unit configured for operating in periods of at least a first high power output mode and a second low power output mode, an optical arrangement configured for receiving output beam of the at least one laser unit and for directing the input beam for generating at least one illumination spot having at least one of a selected spot location and selected spot parameters, and a thermal management system. Wherein the thermal management module is configured and operable for maintaining increased thermal conditions of the optical arrangement when the at least one laser unit is in the second low power output mode.

The disclosed subject matter relates to a computer system and a computer-implemented method for enhancing Scanning Electron Microscope (SEM) imaging output by mitigating and correcting imaging degradation due to charging distortion effects. The methods and systems presented address artifacts caused by charging distortions, improving the accuracy and reliability of SEM imaging for high-precision semiconductor applications. The solution enables rapid, efficient correction, and can be applied during runtime, such as within a semiconductor SEM scanning sequence, to generate augmented SEM images that facilitate more accurate analysis.

The presently disclosed subject matter includes a computer system and a computer-implemented method dedicated to utilizing a machine learning model trained to generate synthetic examination output images that reflect variations in tool configurations. By incorporating different priors related to operational parameters during inference, the system ensures that the synthetic images more accurately represent real-world examination outputs of a specific examination tool. These synthetic images can be applied to various applications, including defect detection and tool matching.

There is provided a system and method of algorithm performance prediction. The method includes obtaining one or more sets of images acquired from one or more sites of a semiconductor specimen to be examined by a target algorithm; extracting values of a set of image attributes from the one or more sets of images, wherein the set of image attributes is expected to result in varied responses from the target algorithm; and providing the values of the set of image attributes to a variation model to predict performance of the target algorithm with respect to a performance metric without executing the target algorithm on the sets of images, wherein the variation model is constructed to predict how the target algorithm responds to variations in values of the set of image attributes.

An electron beam defect classification system, that includes (a) an imager that is configured to generate an electron beam image of a region of a sample by illuminating the region with an electron beam; and (b) a processing circuit configured to process the electron beam image to provide a defect classification result. The processing circuit includes an artificial intelligence processor that is configured to apply artificial intelligence processing on the electron beam image to provide the defect classification result. The artificial intelligence processing represented an artificial intelligence process that exhibits an accuracy that is contributed to a training of the artificial intelligence process using a dataset that has undergone a label error reduction process.

Implementations disclosed describe, among other things, a sample inspection system that includes an illumination subsystem to illuminate a sample with a plurality of time-spaced light pulses generated, using a pulse multiplexing system, from a source light pulse. The pulse multiplexing system includes a plurality of optical loops, each deploying an optical coupler that outputs a first portion of incident light to a sample and provides a second portion of incident light as an input into the next optical loop. The sample inspection system further includes a collection subsystem to collect a portion of light generated upon interaction of the plurality of time-spaced light pulses with the sample, and a light detection subsystem to detect the collected portion of light.

A substrate handling system, that includes (i) a vacuum booster for generating a pulse of first vacuum flow; (ii) a reference vacuum source for producing a reference vacuum flow; and (iii) an vacuum flow control unit that is configured to: (a) combine, during a boost period, the first and reference vacuum flows to provide a combined vacuum flow that is provided, via conduits, to upper vacuum openings of a chuck, and (b) provide the reference vacuum flow to the upper vacuum openings during a substrate fastening period, wherein the chuck and the vacuum booster are spaced apart from each other and are mechanically coupled to a stage.

A cleaning system for cleaning an optical element of a vacuumed space of the charged particle evaluation system of a charged particle evaluation system, the cleaning system includes (a) an ozone supply system configured to provide a cleaning-related flow of ozone to the vacuumed space during a cleaning session; and (b) a laser beam optics configured to (i) generate a laser beam outside the vacuumed space, and (ii) direct the laser beam towards the cleaning-related flow of ozone thereby breaking the cleaning-related flow of ozone to provide cleaning elements for cleaning the optical element.

An inspection system configured to scan a sample is provided. The inspection system comprises a scanning arrangement configured to image one or more physical parameters of the sample, a stage configured to maintain the sample in a suitable position relative to the scanning arrangement during operation thereof, one or more actuators configured to effect relative motion between the sample and the scanning arrangement, a system controller configured to direct operation of the inspection system, and a feedback controller configured to attenuate disturbances arising from relative-motion-induced disturbances. The feedback controller is a non-minimum phase controller, with one or more of its zeros being in the right-half plane.